Our Level 1 LIFT course is designed for "mechanized" ski enthusiasts (who ski at lift served areas, with a snow machine or helicopter) looking to learn more about avalanches and managing the risks. It is taught at our new Backcountry Adventure Center at Sugar Bowl and will use the lifts to access terrain both in and out-of-bounds. It can be taken with fixed heel alpine skis or snowboard with some short side steps and boot packs.
Please familiarize yourself with the following resources as they will help prepare you for the topics discussed in the course.
An AIARE Level 1 Certificate will be awarded upon completion.
Cost: $469
Have your own Lift Pass? Subtract $74
Dates:
Dec 19-21, 2009 (Sat-Mon)
Jan 16-18, 2010 (Sat-Mon - MLK Weekend) 4 Spots
Feb 24-26, 2010 (Wed-Fri)
On the AIARE Avalanche Level 1 LIFT you will learn about:
Introduction to the Avalanche Phenomena
- Types and characteristics of avalanches
- Avalanche motion
- Size classification
- The mountain snowpack: an introduction to metamorphism and layering
Observations and Information Gathering
* Field observation techniques
* Bonding tests: rutschblock, compression test
* Avalanche danger factors “Red Flags”
* Observation checklist
* Avalanche danger scale
* Trip Planning and Preparation
* Avalanche terrain recognition, assessment and selection
* Route finding and travel techniques
* Decision making and Human Factors
* Companion Rescue and Equipment
Classroom vs. Field time:
Day 1 50% Classroom
50% Field time
Travel Techniques
Observations, Terrain Identification
Companion Rescue
Day 2 50% Classroom
50% Field time
Instability Tests
Day 3 20% Classroom
80% Field time
The Perfect Tour
Decision Making
Schedule may vary due to conditions.
Classroom Location: Backcountry Adventure Center at Sugar Bowl
Field Time Location: Mt. Lincoln/Mt. Judah, Sugar Bowl
Prerequisites:
Strong intermediate or greater skiing skills able to handle a variety of snow conditions that may be encountered off the groomed runs.
No previous backcountry travel is required for this course.
